The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 17, 1984
Filed:
Nov. 05, 1980
Mitsuru Hashimoto, Hino, JP;
Masafumi Ohta, Yokohama, JP;
Akio Kozima, Yokohama, JP;
Kiyoshi Sakai, Tokyo, JP;
Masaomi Sasaki, Kawasaki, JP;
Ricoh Co., Ltd., Tokyo, JP;
Abstract
The present invention provides disazo compounds expressed by the general formula ##STR1## [wherein A represents ##STR2## (wherein R represents alkyl radical, alkoxy radical, nitro radical, dialkylamino radical or halogen, n is 0 or an integer ranging from 1 to 3, and R may be identical or different when n is an integer of 2 or 3)]; a process for the preparation of said compounds; and photosensitive materials having a high sensitivity as well as a high flexibility which comprises a conductive support and a photosensitive layer formed thereon, said photosensitive layer containing a disazo pigment, as an effective ingredient, which is expressed by the general formula ##STR3## [wherein R' represents a member selected from the group consisting of hydrogen, ethyl radical, chloroethyl radical and hydroxyethyl radical, A' represents a member selected from the group consisting of ##STR4## (wherein X represents a member selected from the group consisting of aromatic rings such as benzene ring, naphthalene ring, etc., heterocyclic rings such as indole ring, carbazole ring, benzofuran ring, etc. and their substituents, Ar.sub.1 represents a member selected from the group consisting of aromatic rings such as benzene ring, naphthalene ring, etc., heterocyclic rings such as dibenzofuran ring, etc. and their substituents, Ar.sub.2 and Ar.sub.3 represent respectively a member selected from the group consisting of aromatic rings such as benzene ring, naphthalene ring, etc. and their substituents, R.sub.1 and R.sub.3 represent respectively a member selected from the group consisting of hydrogen, lower alkyl radical or phenyl radical and their substituents, and R.sub.2 represents a member selected from the group consisting of lower alkyl radical, carboxyl radical and their esters)].