The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 17, 1984
Filed:
Jun. 02, 1981
Linda M Ephrath, Danbury, CT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Reactive Ion Etching (RIE) apparatus which provides for uniform etching of substrates regardless of their position on a cathode is disclosed. The RIE apparatus utilizes a perforated anode. These perforations are interlaced, intersected or partially blocked with various configurations of conductive elements. Concentric circle, starburst, spiral arm and spiral configurations may be interlaced with the perforations in the anode to obtain uniform etching of substrates regardless of their radial position on the cathode. With all these configurations, the common factor is that the interlaced configurations intersect more perforations near the center of the anode or catcher plate than are intersected at greater radial distances.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile