The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 17, 1984
Filed:
Dec. 14, 1981
Wolf-Dieter Munz, Freigericht, DE;
Hans Wolf, Erlensee, DE;
Leybold Heraeus GmbH, Cologne, DE;
Abstract
The invention concerns an array of cathodes for sputtering apparatus that contains first, a target plate made out of the material to be sputtered, second, a system of magnets with poles of opposite signs positioned behind the target plate so that at least some of the lines of magnetic force emerging from the poles pass through and reenter the target plate, and third, a device that can be adjusted to alter the relative positions of the magnets and the target plate. The array is also set up so that at least some of the magnetic lines of force run from the poles through the target plate and back. The purpose of maintaining largely constant sputtering conditions as the target plate is consumed is achieved in accordance with the invention by moving the adjusting device essentially perpendicular to the largest surface of the target plate.