The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 1984
Filed:
May. 07, 1982
Applicant:
Inventors:
George C Lewis, Jr, Sudbury, MA (US);
Robert A Vanslette, Medfield, MA (US);
Assignee:
GCA Corporation, Bedford, MA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21K / ;
U.S. Cl.
CPC ...
2504421 ; 2504922 ; 277-3 ; 277226 ; 277D / ; 29722 ; 29743 ; 29DI / ;
Abstract
In the electron beam lithographic system disclosed herein, a semiconductor wafer to be exposed is carried on an air bearing puck which is, on both sides, supported or located by balanced annular regions of air pressure. These annular supporting regions surround central evacuated regions which are also balanced so that the puck is not subject to large bending forces. Accordingly, the puck can be constructed to light-weight materials facilitating rapid and precise positioning of the semiconducter wafer with respect to an E-beam generating column.