The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 1984
Filed:
Oct. 19, 1981
Applicant:
Inventors:
Carlo F La Fiandra, New Canaan, CT (US);
Burke E Nelson, West Redding, CT (US);
Assignee:
The Perkin-Elmer Corporation, Norwalk, CT (US);
Primary Examiner:
Int. Cl.
CPC ...
G03B / ;
U.S. Cl.
CPC ...
355 73 ; 355 52 ;
Abstract
Means and methods are provided for controlling the geometry changes in a wafer or mask to permit patterns on the wafer to be matched with projected patterns from the mask. A sealed chamber is provided to receive the edges of the wafer or mask. Pressure is applied from a pressure source into the chamber against the edges of the wafer or mask uniformly in all directions to produce compressive strains until the desired wafer or mask geometry is obtained.