The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 03, 1984
Filed:
Sep. 15, 1982
Beat G Keel, Prior Lake, MN (US);
Tuan P Tran, Bloomington, MN (US);
Mara M Koller, St. Paul, MN (US);
Larry D Zimmerman, Apple Valley, MN (US);
Patrick C Darst, Cottage Grove, MN (US);
Magnetic Peripherals Inc., Minnneapolis, MN (US);
Abstract
A desired feature of deposition material is produced on a substrate by forming an adhesion inhibitor on the substrate in a pattern whose inner edges are adjacent the bounds of the feature being produced. A seedlayer is deposited over the adhesion inhibitor and exposed portions of the substrate, and a mask is formed over the seedlayer adjacent the edges of the adhesion inhibitor, the inner edges of the mask defining the feature being produced. A deposition material is deposited over the exposed seedlayer, and the mask is removed. Unwanted portions of the seedlayer and deposition layer are removed by mechanically lifting off. The adhesion inhibitor serves to inhibit the bonding of the seedlayer to the substrate sufficiently to enable the mechanical lift-off. The adhesion inhibitor is removed, either by lifting off with the seedlayer and deposition layer, or subsequently.