The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 27, 1983
Filed:
May. 15, 1981
Applicant:
Inventors:
Masayoshi Sekiya, Tokyo, JP;
Masao Yabe, Fujinomiya, JP;
Tamotsu Suzuki, Fujinomiya, JP;
Takeji Ochiai, Fujinomiya, JP;
Sumitaka Tatsuta, Fujinomiya, JP;
Assignees:
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Nippon Zeon Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05C / ; B05D / ;
U.S. Cl.
CPC ...
427171 ; 4272071 ; 4273935 ;
Abstract
A subbing process for a photographic light-sensitive material is described comprising applying a polymer latex to a plastic film base, wherein said polymer is a copolymer composed of (1) a diolefin monomer, (2) at least one monovinyl monomer, and (3) at least one monomer having two or more vinyl groups, acryloyl groups, methacryloyl groups, or allyl groups excepting the diolefin monomer, and having a gel fraction of the polymer in the latex is from 50% to 95% by weight.