The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 27, 1983

Filed:

Jun. 14, 1982
Applicant:
Inventor:

Edward H Phillips, Middletown, CA (US);

Assignee:

Optimetrix Corporation, Mountain View, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B / ; G03B / ;
U.S. Cl.
CPC ...
355 43 ; 355-1 ; 355 45 ;
Abstract

A projection lens is disposed directly above a vacuum chuck for projecting an image of an illuminated portion of a semiconductive wafer held thereby to an image plane where that image may be viewed through a pair of objective lenses of a compound microscope. Microcircuitry contained on a reticle held by a holder positioned above the projection lens is photometrically printed onto the semiconductive wafer by passing exposure light through the reticle and the projection lens to the semiconductive wafer. At least one fiber optic source of illuminating light and one or more optical lenses are employed for projecting an image of the fiber optic light source through the objective lens to an entrance pupil of the projection lens without passing through the reticle to provide uniform illumination of the semiconductive wafer and facilitate direct wafer alignment prior to photometrically printing on the semiconductive wafer.


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