The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 20, 1983
Filed:
Apr. 11, 1983
Applicant:
Inventors:
Bernard J Curtis, Gattikon, CH;
Martin Ebnoether, Birmensdorf, CH;
Assignee:
RCA Corporation, New York, NY (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23F / ; B44C / ; C03C / ; C03C / ;
U.S. Cl.
CPC ...
156643 ; 156646 ; 156650 ; 156656 ; 1566591 ; 2041 / ; 2041 / ; 252 791 ; 252 792 ; 427 38 ; 430313 ; 430318 ;
Abstract
A process for reverse etching a layer of chromium on a substrate is provided wherein a layer of resist is formed on the chromium and developed, thus exposing a portion of the chromium. The exposed chromium is passivated by backscattering from a suitable backing plate in a plasma, the resist is removed and the unpassivated chromium etched with a conventional liquid etchant. The pattern formed in the chromium layer is the opposite of that original formed in the resist material.