The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 13, 1983
Filed:
Apr. 05, 1982
Wallace R Jones, Waite Hill Village, OH (US);
Paul A Krieger, Bay Village, OH (US);
John F Haas, Chagrin Falls, OH (US);
The Excello Specialty Company, Cleveland, OH (US);
Abstract
A mask for and method of masking a workpiece which has some predetermined continuous demarcation zone whereby precise painting of a first area disposed on one side of the zone is accommodated. The mask includes opposed faces and a peripheral edge or contour having substantially the same conformation as the demarcation zone. One face includes a narrow band of adhesive extending therearound adjacent the peripheral edge. The mask is accurately positioned on the workpiece to precisely mask a second area thereof along and on the other side of the demarcation zone from the workpiece first area. The first area may then be painted and the mask thereafter removed. To accommodate application in production environments, the other or outer face of the mask may be release coated so that a stack or pad comprised of a plurality of identical masks may be provided at a workstation for individual application to consecutive workpieces. When such a pad is generated, a plurality of mask layers are first prepared so as to have an adhesive band of the desired conformation on the one face thereof. Thereafter, the plurality of layers are placed in a stacked relationship to each other and then die cut to have a predetermined peripheral edge or contour. The subject mask and method are advantageously useable with any number of painting applications having regular and/or irregular demarcation zone conformations.