The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 13, 1983
Filed:
Apr. 15, 1983
Larry D Hartsough, Berkeley, CA (US);
Gryphon Products, Hayward, CA (US);
Abstract
A method and apparatus for forming a thin film on a substrate by sputtering of a material from a cathode, which material is subsequently reacted to form the thin film. A process chamber has a sputter zone which contains a sputter electrode assembly and in which an inert sputtering atmosphere is injected. Isolation means separates the sputtering zone from a reaction zone of the process chamber, into which a chemically reactive atmosphere is injected, and prevents the chemically reactive atmosphere from entering the sputtering zone. A substrate receives a sputtered material in the sputtering zone, and is subsequently transferred to the reaction zone where the sputtered material is contacted by and reacts with the chemically reactive atmosphere therein to form a reacted thin film.