The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 13, 1983
Filed:
Nov. 26, 1982
Eiichi Tachibana, Toda, JP;
Tetsuro Katsuta, Tokyo, JP;
Dai Nippon Insatsu Kabushiki Kaisha, Tokyo, JP;
Abstract
In a one-bath etching process in which gravure cells are formed in the surface of a gravure cylinder with one kind of etching solution having a predetermined density, in order to control the cell depths by suitably selecting the cylinder speed, data is provided by correlating a permeation characteristic which is obtained by an inspecting solution substantially similar in characteristic to the etching solution to that which is obtained by the etching solution, while data is obtained by correlating to cylinder speeds, and these data are compared with data which are obtained from the resist layer of the cylinder which is to be used for printing, to determine the total etching time and the cylinder speeds.