The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 1983
Filed:
Apr. 07, 1982
Hitachi, Ltd., Tokyo, JP;
Abstract
High impact polystyrene having excellent properties is produced by a continuous process comprising feeding rubber and styrene continuously to a multistage horizontal dissolving tank to dissolve the rubber completely with stirring by increasing the temperature of each stage stepwise along the liquid flow direction, feeding the rubber solution to a first polymerizer to effect phase inversion of the rubber and preliminary polymerization of styrene; feeding the pre-polymerized solution to one or more horizontal type polymerizers to undergo bulk polymerization while removing the heat generated therein; and feeding the polymerized solution to a monomer separator to remove the remaining monomer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile