The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 06, 1983

Filed:

Mar. 09, 1982
Applicant:
Inventors:

Kuniomi Etoh, Shiga, JP;

Toshikiyo Tanaka, Toyonaka, JP;

Yoshio Katoh, Otsu, JP;

Takeo Sugiura, Tokorozawa, JP;

Yoshiyasu Itoh, Yono, JP;

Takeo Kohira, Chiba, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ; G03C / ; G03C / ;
U.S. Cl.
CPC ...
430275 ; 430272 ; 430276 ; 430277 ; 430278 ; 430279 ; 430285 ; 430300 ; 430322 ; 430325 ; 430916 ; 430919 ; 430920 ; 430923 ;
Abstract

An image reproducing material comprising a supporting sheet bearing a metal or metallic compound layer having a thickness of 100 to 1000 .ANG. and a photosensitive resin layer, which is characterized in that said photosensitive resin layer contains (1) an ethylenically unsaturated compound which is polymerizable by the action of free radical and chain propagative, (2) a compound showing photochromism by radical mechanism, (3) a free radical producing agent and (4) an acitinic light absorber. There is also provided an image formed (reproduced) material obtained by patterned exposing the above image reproducing material and then processing the same, a method for obtaining such image formed material and also a method for dot-etching such image formed material. By the use of these materials and methods, dot-etching can be effected easily and there are obtained sharp images without the formation of pin holes.


Find Patent Forward Citations

Loading…