The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 1983
Filed:
May. 20, 1982
Kazufumi Ogawa, Hirakata, JP;
Isamu Kitahiro, Yawata, JP;
Matsushita Electric Industrial Co., Ltd., Tokyo, JP;
Abstract
Proposed is a method for manufacturing a color filter having the steps of: forming a stripe- or lattice-shaped light-shield pattern on one major surface of a transparent glass substrate; forming a photosensitive base film on the same major surface of the glass substrate on which the light-shield pattern is formed; exposing the photosensitive base film by light radiated from the other major surface of the glass substrate, using the light-shield pattern as a mask, developing the base film to remove a nonexposed portion of the photosensitive base film immediately above the light-shield pattern and to divide the photosensitive base film along the light-shield pattern; and selectively dyeing divided base film portions to form color layers.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile