The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 1983
Filed:
Mar. 17, 1981
Applicant:
Inventor:
Wolfgang Dahms, Berlin, DE;
Assignee:
Schering Aktiengesellschaft, Berlin and Bergkamen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25D / ;
U.S. Cl.
CPC ...
204 15 ; 204 / ; 204231 ;
Abstract
In a method for galvanic deposition of smooth and ductile copper from acid copper baths, the metal content of the bath is kept constant by using inert anodes together with soluble anodes. The inert anodes are made of precious metal, precious metal alloys or their compounds. The ratio of the geometric surface of inert to soluble anode should amount to from 1:1 to 1:200, preferably from 1:5 to 1:20. The inert anode may be provided with additional potential, and the acid bath may contain organic thio compounds. The method is useful for building up conductor paths of printed circuits.