The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 1983
Filed:
Nov. 23, 1981
Applicant:
Inventor:
Robert V Lorenze, Jr, Webster, NY (US);
Assignee:
Xerox Corporation, Stamford, CT (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B / ;
U.S. Cl.
CPC ...
29603 ; 360121 ; 360122 ;
Abstract
A method for delineating vertically configured thin film magnetic heads formed upon silicon wafer substrates. A plurality of thin film magnetic head arrays are formed on a (110) oriented surface of a single crystal silicon substrate so that the edges of the arrays are aligned parallel to the {111} planes of the substrate. Following photolithographic formation of a mask, ion beam milling perpendicular to the (110) oriented surface of the silicon substrate delineates the thin film magnetic head array structures. Thereafter, the remainder of the silicon substrate is anisotropically etched to completely delineate the individual array structures.