The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 1983
Filed:
Nov. 17, 1980
Jacques Trotel, Paris, FR;
Thomson-CSF, Paris, FR;
Abstract
A sample on which pre-established patterns are to be defined is rigidly fixed to a moving object-holder and subjected to bombardment with a beam of charged particles by means of a microlithographic system. This system comprises an array of elements placed in one plane in a predetermined spatial configuration and an imaging system having a magnification which is considerably less than unity, the elements being each capable of assuming two distinct states. A narrow beam of charged particles which emerges from each element is on-off modulated according to the state assumed by the element under the control of logic circuits. The plane of the sample is adapted to correspond to the plane of the elements with respect to the imaging system and the elements are disposed at the intersections of the lines and columns of a matrix. The logic circuits permit the sequential application of a suitable voltage in accordance with a program which is pre-established in relation to the patterns to be drawn and in synchronism with the displacement of the object-holder.