The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 22, 1983

Filed:

Jan. 18, 1982
Applicant:
Inventor:

Eugene L Stogryn, Edison, NJ (US);

Assignee:

Exxon Research and Engineering Co., Florham Park, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C / ; B01D / ;
U.S. Cl.
CPC ...
564505 ; 423223 ; 423228 ; 423229 ; 423232 ; 423234 ; 564476 ; 564477 ; 564508 ;
Abstract

A novel class of di-secondary aminoethers of the general formula: ##STR1## are disclosed wherein R.sub.1 and R.sub.8 are each independently selected from the group consisting of primary alkyl having 1 to 8 carbon atoms and primary hydroxyalkyl having 2 to 8 carbon atoms, secondary alkyl and secondary hydroxyalkyl radicals having 3 to 8 carbon atoms, tertiary alkyl and tertiary hydroxyalkyl radicals having 4 to 8 carbon atoms, R.sub.2, R.sub.3, R.sub.4, R.sub.5, R.sub.6 and R.sub.7 are each independently selected from the group consisting of hydrogen, C.sub.1 -C.sub.3 alkyl and hydroxyalkyl radicals, with the proviso that R.sub.2, R.sub.3, R.sub.6, and R.sub.7 are C.sub.1 -C.sub.4 alkyl or hydroxyalkyl radicals when R.sub.1 and R.sub.8 are primary alkyl or hydroxyalkyl radicals, and at least one of R.sub.2 or R.sub.3 and R.sub.6 or R.sub.7 are C.sub.1 to C.sub.3 alkyl or hydroxyalkyl radicals when R.sub.1 and R.sub.8 are secondary alkyl radicals, m, n and p are positive integers ranging from 2 to 4, and o is either zero or a positive integer ranging from 1 to 10. The compounds are useful in the selective removal of H.sub.2 S from gaseous mixtures containing H.sub.2 S and CO.sub.2.


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