The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 22, 1983
Filed:
Jul. 02, 1982
Kimihiko Sato, Yokohama, JP;
Kunihiko Terase, Tokyo, JP;
Hitoshi Kijimuta, Ebina, JP;
Yukinori Ohta, Yokohama, JP;
Asahi Glass Company Ltd., Tokyo, JP;
Abstract
A method for synthesizing amorphous silicon nitride, wherein silicon halide and ammonia are reacted in a reaction vessel at a high temperature in the absence of oxygen to thereby synthesize powder of amorphous silicon nitride, then the powder is separated from a gas containing therein gaseous ammonia halide which has been produced simultaneously with said amorphous silicon nitride by use of a collecting means, comprises directly mixing, in advance of the separation, cool gas containing therein neither oxygen nor moisture into said gas to cool down said powder and gas so that both substances may be put in said collecting means without deposition of ammonium halide to the inner wall of the reaction vessel, and other component parts.