The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 18, 1983

Filed:

Dec. 15, 1982
Applicant:
Inventor:

Christopher G Demmer, Cambridge, GB;

Assignee:

Ciba-Geigy Corporation, Ardsley, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G / ; C08G / ; C08G / ;
U.S. Cl.
CPC ...
525533 ; 428460 ; 525523 ; 528107 ; 528109 ; 528158 ;
Abstract

Resinous salts, prepared by thioalkylation or sulfoalkylation of a phenol obtained by advancement of a polyepoxide, followed by at least partial neutralization, have the general formula ##STR1## where R.sup.- represents a group of formula --S--R.sup.1 --COO.sup.- or a group of formula --SO.sub.3.sup.- ; R.sup.1 represents an aliphatic, aromatic or araliphatic divalent group which may contain a further group --COO.sup.- M.sup.+ ; R.sup.2 represents --H or alkyl; one of R.sup.3 and R.sub.1.sup.3 represents a hydroxyl group and the other represents --H, halogen, alkyl, or alkenyl; each R.sup.4 represents --H, halogen, alkyl, or alkenyl; R.sup.5 represents --H, halogen, alkyl, alkenyl, or a group --CH(R.sup.2)OH, --CH(R.sup.2)OR.sup.8, or --CHR.sup.2 --R.sup.- M.sup.+ ; R.sup.6 represents the residue of a polyepoxide, preferably of average mol. wt. 1000-5000; each of the groups R.sup.7, which may be the same or different, represents --H or a covalent bond linked to the group R.sup.6 ; R.sup.8 represents alkyl or alkoxyalkyl; R.sup.9 denotes the residue of an optional terminating group; m represents 1, 2, 3, or 4; n and p represent zero or 1, X represents alkylene, carbonyl, sulfonyl, oxygen, sulfur, or a valence bond; and M.sup.+ represents a hydrogen ion or a cation derived from an alkali metal, ammonia, an amine or one valence of a polyvalent cation, at least 25% of the ions being a said cation. Composition comprising these salts and, if required, a phenoplast, an aminoplast, or a blocked polyisocyanate, are stable when dispersed in water, usually with the aid of a minor amount of an organic solvent, and may be used to form protective films, especially for metal containers.


Find Patent Forward Citations

Loading…