The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 1983
Filed:
Oct. 27, 1980
Hendrik de Lang, Heeze, NL;
Gijsbertus Bouwhuis, Eindhoven, NL;
U.S. Philips Corporation, New York, NY (US);
Abstract
A device is disclosed for processing optical information comprising a system of optical elements (6, 7, 9, 10, 12, 13) arranged along an optical main axis (11) for guiding a light beam (4) to a radiation-sensitive detection system (8) at least one coma correction plate (13, 20, 21) is provided in the system of optical elements and comprises a substrate having a dielectric layer varying in thickness so as to at least partly compensate for axial coma due to differences in path length of the light rays. Also disclosed is a method of manufacturing such a coma correction plate in which during the vapor deposition of the dielectric layer, a plate-shaped substrate (31) is moved at a constant speed below a template (33) parallel to an axis (34) which is situated in the plane of the template. The template (33) is situated between the vapor deposition source (30) and the substrate (31) and has an aperture (34) which is divided by the axis. A part (36) of the edge of the aperture on either side of the axis varies as a third power function of the distance to the axis, the point of intersection (37) of the axis with the part of the edge being taken as zero point.