The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 11, 1983
Filed:
May. 13, 1982
Harry W Gordon, New York, NY (US);
Nanette R Avila, New York, NY (US);
Del Laboratories, Inc., Farmingdale, NY (US);
Abstract
A nail polish that does not contain as a film-forming ingredient a potentially explosive nitrocellulose film former, and furthermore it does not contain formaldehyde or formaldehyde resin as a hardener which embrittles and dries the nails, and is non-allergenic and non-yellowing. The new nail polish contains ethyl methacrylate homopolymer of a molecular weight of approximately 25,000 as the film-forming ingredient, and includes as necessary modifiers cellulose acetate propionate of a viscosity of approximately 20 seconds (ASTM method D-1343), acetyl tributyl citrate, a mixture of sucrose esters and, optionally, camphor. In addition, the new nail polish contains organic volatile solvents and is essentially water free. It also may contain other additives commonly employed in nail polishes such as polyamide resins, thickeners, pearlescents, pigments, U.V. absorbers and fragrances.