The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 04, 1983
Filed:
Mar. 29, 1982
Applicant:
Inventors:
Harry W Deckman, Clinton, NJ (US);
John H Dunsmuir, Madison, NJ (US);
Assignee:
Exxon Research and Engineering Co., Florham Park, NJ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C / ; C03C / ; C03C / ; H01L / ;
U.S. Cl.
CPC ...
156643 ; 156646 ; 1566591 ; 2041 / ; 427198 ; 427272 ; 427282 ;
Abstract
Large area random and mosaic arrays of identical submicron microcolumnar structures can be produced on surfaces by directionally ion etching a monolayer film of spherical colloidal particles.
Deckman, Harry. (1983). Natural lithographic fabrication of microstructures over large areas (U.S. Patent No. 4407695). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4407695
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile