The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 27, 1983
Filed:
Feb. 01, 1982
Applicant:
Inventors:
Takao Edahiro, Mito, JP;
Gotaro Tanaka, Kanagawa, JP;
Toru Kuwahara, Kanagawa, JP;
Masaaki Yoshida, Kanagawa, JP;
Assignees:
Nippon Telegraph & Telephone Public Corporation, Tokyo, JP;
Sumitomo Electric Industries, Ltd., Osaka, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03B / ; C03B / ;
U.S. Cl.
CPC ...
65 182 ; 65-312 ; 65 32 ;
Abstract
A process for producing high-purity silica glass wherein glass-forming chlorides, hydrogen gas, oxygen and an inert gas are supplied from a glass burner, the chlorides are decomposed by flame oxidation to form fine grains of glass which are deposited on a starting member and the glass deposit is sintered to provide a transparent vitreous substance, the volume ratio of oxygen gas to the sum of the chlorides and hydrogen gas being greater than about 0.6, preferably greater than about 1.0, and less than about 20.