The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 1983
Filed:
Jul. 14, 1982
Applicant:
Inventor:
George M Engle, Scottsdale, AZ (US);
Assignee:
Advanced Semiconductor Materials/AM., Phoenix, AZ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ; B05B / ; B44C / ; C03C / ;
U.S. Cl.
CPC ...
156643 ; 118620 ; 118723 ; 156646 ; 156345 ; 2041 / ; 2041 / ; 204298 ; 427 39 ; 427 95 ;
Abstract
Method and apparatus for improved uniformity in an externally excited non-thermal chemical reaction process. In the inventive process, the reactant is externally activated for a time short compared with the time during which reactant depletion would otherwise occur. The reactant is then deactivated for a period of time comparable to the transit time across the workload. In this way improved uniformity is obtained by reducing the depletion of the reactant as it flows across the workload.
Published as:
GB8312094D0; US4401507A; DE3315014A1; FR2530158A1; NL8302504A; JPS5931022A; GB2124924A; GB2124924B; DE3315014C2; FR2530158B1;