The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 09, 1983
Filed:
Jun. 28, 1982
Jerome D Wisnosky, Lancaster, PA (US);
Doris F Carlson, Lancaster, PA (US);
Armstrong World Industries, Inc., Lancaster, PA (US);
Abstract
The present invention contemplates a method to reduce the liquid solvent contact time required to develop a latent polymeric relief image in a layer of polymeric material that is selectively exposed to radiation so that there is formed a layer having exposed and unexposed areas. In the method of the present invention, the layer is exposed to the gaseous vapors of at least one solvent for the more soluble area, after which it is contacted with a liquid solvent which preferentially dissolves the material from the more soluble area and which does not affect the polymerized material which forms the relief image.