The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 09, 1983
Filed:
Jun. 16, 1981
Johnny G Barnes, Austin, TX (US);
Rudolph E Chukran, Austin, TX (US);
Patrick J Hurley, Austin, TX (US);
Harry L Lineman, Round Rock, TX (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Overstruck text is justified by distributing the white space residue at the end of the unjustified line among the interword spaces for justification. The amount of the residue distributed is used to determine a number of overstrike characters which will overstrike the text including these expanded interword spaces. This is accomplished by placing controls in the text stream during editing to delineate the text to be overstruck. Before printing, these controls in the edited data stream are detected to cause the print line to be first justified by expansion of interword spaces and then followed by overstriking with the appropriate number of overstrike characters determined during the justification process.