The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 09, 1983

Filed:

Dec. 16, 1981
Applicant:
Inventors:

Gary F Derbenwick, Colorado Springs, CO (US);

James R Adams, Colorado Springs, CO (US);

Matthew V Hanson, Colorado Springs, CO (US);

William D Ryden, Colorado Springs, CO (US);

Assignee:

Inmos Corporation, Colorado Springs, CO (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
29571 ; 2957 / ; 2957 / ; 29591 ; 148-15 ; 357 49 ;
Abstract

A method is described for fabricating MOS devices of the type found in very large scale integrated circuits. According to the method described herein, various gate oxides and insulating layers are fabricated independently of each other in order to independently tailor their thicknesses and thereby provide improved isolation between gate electrodes and interconnects, and independently controllable operating characteristics for multiple gate electrode structures. The fabrication of a dynamic RAM memory cell, an overlapping gate CCD device and a self-aligned MNOS transistor cell are described using the disclosed method.


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