The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 02, 1983

Filed:

Sep. 05, 1980
Applicant:
Inventors:

Dietrich Hoffmeister, Oberkochen, DE;

Wilhelm Egle, Konigsbronn, DE;

Assignee:

Carl Zeiss-Stiftung, Oberkochen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
313331 ; 313250 ; 313336 ; 313268 ;
Abstract

The invention contemplates lead-through structure for the high-voltage electrode of an electron microscope or the like, in conjunction with shaping of the high-voltage electrode and of the body of insulating material via which the lead-through is supported, in reference to metal envelope structure. The high-voltage electrode has a step-wise enlargement, and the surface of the insulating material which is exposed to the vacuum commences at the start of the step-wise enlargement. As a result, the field strength along the vacuum-exposed insulator surface is so influenced that a minimum electric field strength is produced at the boundary line between the vacuum and the high-voltage electrode. The further result is to prevent occurrence of microdischarges.


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