The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 02, 1983

Filed:

Nov. 10, 1981
Applicant:
Inventors:

Nitin V Desai, Hightstown, NJ (US);

Eugene S Poliniak, Willingboro, NJ (US);

Assignee:

RCA Corporation, New York, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ; B05D / ; G03C / ;
U.S. Cl.
CPC ...
430296 ; 430270 ; 430276 ; 430317 ; 430318 ; 430323 ; 430326 ; 430330 ; 430327 ; 427 431 ; 20415913 ; 156643 ;
Abstract

This invention relates to novel poly(silane sulfone) copolymers having repeating units represented by the formula ##STR1## wherein R is alkyl and n is an integer. Positive resist recording media prepared from the subject copolymers demonstrate excellent sensitivity and resolution and are resistant to oxygen plasma etching.


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