The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 26, 1983
Filed:
Sep. 14, 1981
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
The invention provides a novel and efficient method for modifying the surface properties of a shaped article of a synthetic resin such as a polyvinyl chloride resin in which a remarkable anti-static effect is obtained on the surface so that accumulation of static electricity on the surface is greatly reduced. The inventive method comprises exposing the surface of the shaped article to a low temperature plasma generated in a gaseous atmosphere containing a nitrogen-containing organic compound such as an amine, acid amide, diamine and heterocyclic organic compound having at least one nitrogen atom in a molecule as the ring member at a pressure from 0.001 to 10 Torr. The gas or vapor of the above mentioned nitrogen-containing organic compound is preferably diluted with an inorganic gas. The effectiveness of the above described plasma treatment is further enhanced when the plasma-treated surface of the shaped article is subsequently brought into contact with a halogen, a hydrogen halide or an organic halogen compound, e.g. chlorine, hydrogen chloride, hydrogen bromide and allyl chloride, preferably, in a gaseous phase at a pressure of at least 10 Torr.