The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 26, 1983
Filed:
Apr. 17, 1981
Richard A Denton, Marlton, NJ (US);
Bawa Singh, Cherry Hill, NJ (US);
Denton Vacuum Inc., Cherry Hill, NJ (US);
Abstract
The present invention provides, in a sputtering apparatus, an anode means interposed between the cathode and the substrate (upon which material is to be deposited) which acts to intercept electrons so that they do not impinge on the substrate and which is formed to permit the material dislodged from the cathode (by impinging ions) to pass beyond the anode and be deposited on the substrate. While the present invention can be usefully employed without the aid of a magnetic field, in a preferred embodiment, the present invention is made part of a planar magnetron.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile