The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 19, 1983

Filed:

Dec. 17, 1981
Applicant:
Inventor:

Bohdan Gnyra, Kingston, CA;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B / ;
U.S. Cl.
CPC ...
423485 ; 423484 ; 423488 ;
Abstract

In the generation of hydrogen fluoride gas for the production of AlF.sub.3 by the reaction of fluorspar with concentrated sulphuric acid a small amount of aluminium sulphate is introduced into the reactive mix to assist in the retention of phosphorous compounds in the solid residues of the reaction and thus reduce the phosphorous content of the gaseous HF. Aluminium sulphate may be added as alum or may be generated in situ in the sulphuric acid by addition of an alumina hydrate, preferably before the acid is brought into contact with fluorspar. The addition of a small amount of calcium carbonate to the fluorspar also improves retention of phosphorous compounds in the solid residues in some instances.


Find Patent Forward Citations

Gnyra, Bohdan. (1983). Method for curtailing phosphorous impurity in the production of hydrogen (U.S. Patent No. 4394365). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4394365

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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