The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 1983
Filed:
Mar. 29, 1982
Applicant:
Inventors:
Jeffery A Whalin, Miami Lakes, FL (US);
Charles W Shanley, Plantation, FL (US);
Michael N Scansaroli, Pembroke Pines, FL (US);
Lawrence N Dworsky, Northbrook, IL (US);
Assignee:
Motorola, Inc., Schaumburg, IL (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430320 ; 430313 ; 430314 ; 430260 ; 156630 ; 156293 ; 29 2535 ;
Abstract
A method of captivating a substrate within a holder for photolithographic processing is shown. A substrate is placed within the aperture of a holder and is sandwiched into place by laminating it with layers of dry film photopolymer resist. Portions of the photopolymer resist are polymerized. Unpolymerized portions are washed away leaving retaining tabs of polymerized resist which hold the substrate within the holder for an etching or plating process.