The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 1983
Filed:
May. 07, 1981
Applicant:
Inventors:
Assignee:
Sony Corporation, Tokyo, JP;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; G02B / ;
U.S. Cl.
CPC ...
430-2 ; 430-1 ; 430321 ; 430-5 ; 430945 ; 350-372 ; 350-373 ;
Abstract
A method of producing an inline hologram lens is disclosed which includes the steps of producing a diffracted wave beam by a diffraction device, producing a spherical wave beam by an optical device, providing the diffracted wave beam perpendicularly incident on a photo-sensitive layer as a reference wave beam, simultaneously providing a spherical wave beam perpendicularly incident on the photo-sensitive layer as a subject wave beam through the diffraction device, and developing the photo-sensitive layer to produce an inline hologram lens.