The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 05, 1983
Filed:
Aug. 24, 1981
Joseph L McLaughlin, Marblehead, MA (US);
Itek Corporation, Lexington, MA (US);
Abstract
An arrangement for interferometrically recording in a single interferogram a full development of the contour of a symmetrical reflective surface, such as an internal or external cylindrical or conical surface. An optical system projects a light wave onto the reflective surface such that a reflected wave is formed. The reflected wave is interfered with a reference light wave to generate an interference pattern, and only a selected portion of the interference pattern is projected onto a film medium for recording. The reflective surface is scanned with the projected wave by relatively moving the projected wave relative to the surface, and synchronously therewith, the projected interference pattern is moved relative to the recording medium in a manner such that the information recorded on the film medium is a full development of the contour of the reflective surface.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile