The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 1983
Filed:
Jul. 24, 1981
J Samuel Batchelder, Katonah, NY (US);
Other;
Abstract
The present invention provides method and apparatus for manipulating one or more chemicals within a reaction chamber or housing by dielectrophoretic forces. At least two materials, one of which is a chemical to be manipulated, are provided within the housing. The materials have different dielectric constants. A non-uniform electrical field is applied to the materials within the housing and, as a result of dielectrophoretic forces generated by the applied field, the relative positions of the materials are varied. Accordingly, a chemical can be selectively manipulated to different positions within the housing as, for example, to a catalyst or chemical analyzer located within the housing. The present apparatus may also be used to simultaneously manipulate more than one chemical to mix, or induce a chemical reaction, between the different chemicals in the housing.