The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 1983
Filed:
Jun. 01, 1982
Yoshimi Fujita, Akishima, JP;
Toshiharu Yamashita, Hachioji, JP;
Hoya Corporation, Tokyo, JP;
Abstract
A method for irradiating a chemically machinable light-sensitive glass plate with a parallel bundle of ultraviolet rays so as to form a tappered polygonal hole in the glass plate. A mask having a regular polygonal opening having n vertexes is mounted on a machinable light-sensitive glass plate and a light source capable of generating a parallel bundle of ultraviolet is disposed so that one of the vertexes of the polygonal opening is positioned at the longest point from the center of the light source. The glass plate is then irradiated. Thereafter, the light source is rotated about a center axis of the opening by an angle equal to 360.degree./n and the glass plate is re-irradiated. This procedure is conducted so that the glass plate is irradiated n times.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile