The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 21, 1983

Filed:

Jan. 04, 1982
Applicant:
Inventors:

Lefteris N Valsamis, West Haven, CT (US);

Zehev Tadmor, Haifa, IL;

Assignee:

USM Corporation, Farmington, CT (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01F / ; B01F / ; B29B / ;
U.S. Cl.
CPC ...
366 99 ; 366307 ; 366315 ; 415 90 ; 415102 ; 425224 ; 425466 ;
Abstract

Novel, improved rotary processors which include a rotatable element carrying a plurality of annular channels and a stationary element providing a coaxial, closure surface operationally arranged with the channels to provide enclosed processing passages. The so-formed plurality of processing passages provide a highly efficient processing stage particularly for melting polymer material. Each processing passage of the processing stage includes inlet means, outlet means and a channel member associated with the stationary element and arranged and adapted so that material fed to the inlet can be carried forward by the rotatable channel walls to the blocking member for discharge from the passage. In rotary processors of this invention the clearance between the rotary surface carrying the channels and the stationary coaxial closure surface is relatively wide and permits substantial amounts of material to be interchanged between passages of the processing stage. The interchange provides especially efficient, intensive mixing for material processed in the stage. Also, the interchanged material which passes through the relatively wide clearance can be subjected to conditions of high shear and high temperatures.


Find Patent Forward Citations

Loading…