The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 14, 1983
Filed:
Sep. 22, 1980
Applicant:
Inventors:
Eric F Schulte, Richardson, TX (US);
Vernon R Porter, Plano, TX (US);
Assignee:
Texas Instruments Incorporated, Dallas, TX (US);
Primary Examiner:
Int. Cl.
CPC ...
B23K / ;
U.S. Cl.
CPC ...
2191 / ; 2191 / ;
Abstract
A method for patterning layers of material on a substrate without photoresist by using a selective sublimation process. Differences in thermal conductivity of materials underneath a layer of material to be patterned cause patterning by sublimation over areas of low thermal conductivity, initiated by a pulsed or swept radiated energy source.