The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 31, 1983

Filed:

Oct. 20, 1980
Applicant:
Inventor:

David J Forshee, Oxford, MI (US);

Assignee:

Other;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21F / ;
U.S. Cl.
CPC ...
2505161 ; 2-9 ;
Abstract

A protective face mask to shield an x-ray technician or machine operator primarily from random secondary or scatter x-rays deflected toward his face, head and neck by the table, walls, equipment and other reflecting elements in an x-ray room, during the period of exposure while adjacent the object or person being exposed to the x-ray beam. The face mask is formed of a lens portion supported in a plastic frame, upon the lower portion of which is removably attached a bib shield that in turn is removably attachable to an apron. The frame of the face mask, bib shield and apron are preferably lined with lead sheets to protect the neck, face, chest and body of the technician from the random secondary or scatter x-ray beams. The face mask and bib shield can be formed of a molded plastic material as a unitary device, the lens portion being attached to the frame therefor.


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