The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 17, 1983

Filed:

Oct. 09, 1981
Applicant:
Inventors:

Al F Tasch, Jr, Richardson, TX (US);

Pallab K Chatterjee, Richardson, TX (US);

Horng-Sen Fu, Sunnyvale, CA (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
357 23 ; 357 67 ;
Abstract

A novel metal-oxide-semiconductor (MOS) field effect transistor having enhanced oxide thickness at the edge of the gate electrode and having metal silicide regions in the gate electrode and source and drain areas. The enhanced oxide thickness improves interconnect-to-interconnect breakdown voltage in multilevel interconnect devices as well as minimizing gate overlap of source and drain. The metal silicide regions reduce series resistance and improve device speed and packing density.


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Tasch, Jr, Al. (1983). High performance submicron metal-oxide-semiconductor field effect (U.S. Patent No. 4384301). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4384301

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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