The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 17, 1983
Filed:
Jul. 23, 1980
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Abstract
A substrate bias generator which includes: an MOS capacitor having an electrically insulating film located between two electrodes, one of which is disposed on one main face of a P.sup.- semiconductor substrate; and first, second and a third N.sup.+ semiconductor regions disposed in a spaced relationship on that main face. The first and second regions form a grounded source and a drain of an MOSFET having a gate connected to both the drain and the other electrode of the capacitor. The second and third regions form a source and a drain of another MOSFET having a gate connected to both the drain and the other main face of the substrate. A train of square pulses is supplied to the one electrode of the capacitor.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile