The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 10, 1983
Filed:
Apr. 10, 1981
Atsushi Shibata, Katsuta, JP;
Takeshi Koike, Ibaraki, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A system for driving a rotary member for implanting ions into wafers of semiconductor devices includes a first vacuum chamber receiving the rotary member connected to a rotary shaft through a vacuum seal supported in the central portion of a shield which defines a part of the first vacuum chamber, and a second vacuum chamber receiving a peripheral portion of a shield in airtight relation. The shield is supported by two pairs of O-rings mounted in the second vacuum chamber and arranged in juxtaposed relation on opposite sides of the peripheral portion of the shield. The O-rings provide a hermetical seal to the first and second vacuum chambers. A motor is operatively connected to the rotary shaft for rotating the rotary member, and the shield is connected to another motor through a nut-and-screw arrangement. By moving the shield in reciprocatory movement to cause the peripheral portion to move in sliding movement in the second vacuum chamber, the rotary member can be moved in reciprocatory movement in the plane of its rotation without the risk of the vacuum in the first vacuum chamber being interferred with.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile