The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 1983
Filed:
Mar. 26, 1980
Kenneth S Sachar, Brookline, MA (US);
Victor J Silvestri, Mount Kisco, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A silicon substrate adapted for large scale integrated electronic circuits upon a lower surface has its upper surface coated with a highly porous heat sink film. The film is composed of a porous metal, preferably aluminum, formed by vacuum deposition (evaporation or sputtering) at a high pressure of an inactive gas. The gas can have a pressure of from about 0.5-100 millitorr, and a suitable gas is argon. A porous aluminum film with interconnected nucleation sites which are in the form of reservoir type cavities is manufactured on a silicon surface. The cavities tend to trap vapor of a liquid coolant in contact with the thin film contained in a package enclosing the substrate and its integrated circuit. Cooling fins can be used to cool the coolant.