The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 1983
Filed:
May. 23, 1980
Applicant:
Inventors:
Assignee:
Hitachi, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B / ;
U.S. Cl.
CPC ...
356401 ;
Abstract
In a reduction projection aligner system wherein a pattern on a reticle is formed directly on a wafer by reducing, projecting and printing it, a positioning pattern on the wafer is optically magnified and projected and then focused onto a focal plane where a slit scans the projected image. The distance from a mechanical origin provided on the supporting body of the system to the positioning pattern on the wafer is then measured on the basis of the movement of the slit, and the reticle is then relatively moved and positioned so as to coincide with the position of the wafer relative to the body of the system, thereby bringing the wafer and the reticle into coincidence.