The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 05, 1983
Filed:
Aug. 26, 1977
Pallab K Chatterjee, Dallas, TX (US);
Aloysious F Tasch, Jr, Richardson, TX (US);
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
A charge coupled device is disclosed which includes a plurality of stages having increased charge storage capacity and decreased leakage current. Each stage is comprised of a semiconductor substrate of a first-type conductivity having a first surface. A charge transfer channel extends through the stage. An insulating layer of non-uniform thickness lies on the first surface. The insulating layer has at least two spaced apart relatively thick portions traversing the channel, and has relatively thin portions traversing the channel throughout the spaces between the spaced apart thick portions. Phase electrodes traverse the channel such that each phase electrode overlies one relatively thick portion and one adjacent relatively thin portion of the insulating layer. A shallow dopant layer of a second-type conductivity lies throughout the channel relatively near to the first surface. An enhanced first-type conductivity dopant layer lies throughout the channel relatively far from the first surface and has a doping which is greater than the doping of the first-type conductivity semiconductor substrate.