The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 1983
Filed:
Nov. 28, 1980
Masumi Atsukawa, Hiroshima, JP;
Naoharu Shinoda, Hiroshima, JP;
Atsushi Tatani, Hiroshima, JP;
Taku Shimizu, Kawasaki, JP;
Mitsubishi Jukogyo Kabushiki Kaisha, Tokyo, JP;
Abstract
A wet process for stack gas treatment wherein the stack gas is scrubbed with a suspension containing calcium hydroxide and/or calcium carbonate to remove sulfur oxides from the gas, characterized in that (1) air or oxygen-containing gas is supplied to the gas scrubber so as to oxidize at least 18% of the sulfur oxides absorbed by the scrub liquid to gypsum, and then part of the gypsum from the gypsum-containing scrub liquid partly taken out is recycled to the scrubber, or (2) part or whole of the scrub liquid is taken out from the scrubber into an oxidizer, where it is oxidized with the supply of air or oxygen-containing gas, and, after the oxidation, part of the scrub liquid from the oxidizer is recycled to the scrubber, whereby at least 18% of the sulfur oxides absorbed from the gas by the scrub liquid is oxidized to gypsum.