The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 15, 1983
Filed:
Jul. 07, 1980
Applicant:
Inventors:
John H Gaul, Midland, MI (US);
Donald R Weyenberg, Midland, MI (US);
Assignee:
Dow Corning Corporation, Midland, MI (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B32B / ; B05D / ;
U.S. Cl.
CPC ...
428446 ; 423341 ; 423349 ; 427226 ; 4273741 ; 427377 ; 4273977 ;
Abstract
What is disclosed is a method of forming silicon from the degradation of polychlorosilanes, a method of coating a substrate with said silicon and a product of said coating method. The method of forming silicon consists essentially of pyrolyzing said polychlorosilanes in an inert atmosphere or in a vacuum at a temperature of 500.degree. C. to 1450.degree. C.
Quick Actions:
Gaul, John. (1983). Preparation of silicon metal through polymer degradation (U.S. Patent No. 4374182). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4374182
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile